Dielectric breakdown I: A review of oxide breakdown (Record no. 53368)

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Transcribing agency CICY
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Classification number (OCLC) (R) ; Classification number, CALL (RLIN) (NR) B-19230
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Title Dielectric breakdown I: A review of oxide breakdown
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Volume/sequential designation Microelectronics Journal, 27(7), p.611-622., 1996
520 3# - SUMMARY, ETC.
Summary, etc. This paper gives an overview of the dielectric breakdown in thin oxide layers on silicon. First test methods are discussed, followed by their application to the estimation of the oxide lifetime. The main part of the paper is devoted to the physical background of the intrinsic breakdown. Finally, defect-related or extrinsic breakdown is discussed.
700 12 - ADDED ENTRY--PERSONAL NAME
Personal name Verweij, J. F.
700 12 - ADDED ENTRY--PERSONAL NAME
Personal name Klootwijk, J. H.
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Uniform Resource Identifier <a href="https://drive.google.com/file/d/1R_v37d-Es1sq-UKh1AbCbYsKdLHk5Sus/view?usp=drivesdk">https://drive.google.com/file/d/1R_v37d-Es1sq-UKh1AbCbYsKdLHk5Sus/view?usp=drivesdk</a>
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