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Different properties of SV channels in root vacuoles from near isogenic Al-tolerant and Al-sensitive wheat cultivars

Tipo de material: TextoTextoSeries ; FEBS Letters, 579(30), p.6890-6894, 2005Trabajos contenidos:
  • Wherrett, T
  • Shabala, S
  • Pottosin, I
Tema(s): Recursos en línea: Resumen: Patch-clamp experiments revealed that near isogenic ET8 (Al-tolerant)and ES8 (Al-sensitive)wheat cultivars differed significantly in slow vacuolar channel properties. Under control conditions, whole vacuole currents displayed faster deactivation in ES8. Application of 1.4 lM vacuolar Al3+ caused a 20 mV increase in the activation threshold and slowed activation kinetics in ET8 but not in ES8. Channel density was about 30
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Patch-clamp experiments revealed that near isogenic ET8 (Al-tolerant)and ES8 (Al-sensitive)wheat cultivars differed significantly in slow vacuolar channel properties. Under control conditions, whole vacuole currents displayed faster deactivation in ES8. Application of 1.4 lM vacuolar Al3+ caused a 20 mV increase in the activation threshold and slowed activation kinetics in ET8 but not in ES8. Channel density was about 30

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