Different properties of SV channels in root vacuoles from near isogenic Al-tolerant and Al-sensitive wheat cultivars
Tipo de material:
TextoSeries ; FEBS Letters, 579(30), p.6890-6894, 2005Trabajos contenidos: - Wherrett, T
- Shabala, S
- Pottosin, I
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CICY Documento préstamo interbibliotecario | Ref1 | B-9423 (Browse shelf(Opens below)) | Available |
Patch-clamp experiments revealed that near isogenic ET8 (Al-tolerant)and ES8 (Al-sensitive)wheat cultivars differed significantly in slow vacuolar channel properties. Under control conditions, whole vacuole currents displayed faster deactivation in ES8. Application of 1.4 lM vacuolar Al3+ caused a 20 mV increase in the activation threshold and slowed activation kinetics in ET8 but not in ES8. Channel density was about 30
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