000			03816nam a22005055i 4500
001			978-0-387-29261-8
003			DE-He213
005			20250710083944.0
007			cr nn 008mamaa
008			100301s2007 xxu| s |||| 0|eng d
020			_a9780387292618 _a99780387292618
024	7		_a10.1007/978-0-387-29261-8 _2doi
100	1		_aAlford, Terry L. _eauthor.
245	1	0	_aFundamentals of Nanoscale Film Analysis _h[recurso electrónico] / _cby Terry L. Alford, Leonard C. Feldman, James W. Mayer.
264		1	_aBoston, MA : _bSpringer US, _c2007.
300			_aXIV, 326 p. 200 illus. _bonline resource.
336			_atext _btxt _2rdacontent
337			_acomputer _bc _2rdamedia
338			_arecurso en línea _bcr _2rdacarrier
347			_atext file _bPDF _2rda
505	0		_aAn Overview: Concepts, Units, and the Bohr Atom -- Atomic Collisions and Backscattering Spectrometry -- Energy Loss of Light Ions and Backscattering Depth Profiles -- Sputter Depth Profiles and Secondary Ion Mass Spectroscopy -- Ion Channeling -- Electron-Electron Interactions and the Depth Sensitivity of Electron Spectroscopies -- X-ray Diffraction -- Electron Diffraction -- Photon Absorption in Solids and EXAFS -- X-ray Photoelectron Spectroscopy -- Radiative Transitions and the Electron Microprobe -- Nonradiative Transitions and Auger Electron Spectroscopy -- Nuclear Techniques: Activation Analysis and Prompt Radiation Analysis -- Scanning Probe Microscopy.
520			_aModern science and technology, from materials science to integrated circuit development, is directed toward the nanoscale. From thin films to field effect transistors, the emphasis is on reducing dimensions from the micro to the nanoscale. Fundamentals of Nanoscale Film Analysis concentrates on analysis of the structure and composition of the surface and the outer few tens to hundred nanometers in depth. It describes characterization techniques to quantify the structure, composition and depth distribution of materials with the use of energetic particles and photons. The book describes the fundamentals of materials characterization from the standpoint of the incident photons or particles which interrogate nanoscale structures. These induced reactions lead to the emission of a variety of detected of particles and photons. It is the energy and intensity of the detected beams that is the basis of the characterization of the materials. The array of experimental techniques used in nanoscale materials analysis covers a wide range of incident particle and detected beam interactions. Included are such important interactions as atomic collisions, Rutherford backscattering, ion channeling, diffraction, photon absorption, radiative and nonradiative transitions, and nuclear reactions. A variety of analytical and scanning probe microscopy techniques are presented in detail.
650		0	_aCHEMISTRY.
650		0	_aCONDENSED MATTER.
650		0	_aPARTICLES (NUCLEAR PHYSICS).
650		0	_aELECTRONICS.
650		0	_aNANOTECHNOLOGY.
650		0	_aSURFACES (PHYSICS).
650	1	4	_aCHEMISTRY.
650	2	4	_aCHARACTERIZATION AND EVALUATION OF MATERIALS.
650	2	4	_aSURFACES AND INTERFACES, THIN FILMS.
650	2	4	_aNANOTECHNOLOGY.
650	2	4	_aSOLID STATE PHYSICS AND SPECTROSCOPY.
650	2	4	_aCONDENSED MATTER.
650	2	4	_aELECTRONICS AND MICROELECTRONICS, INSTRUMENTATION.
700	1		_aFeldman, Leonard C. _eauthor.
700	1		_aMayer, James W. _eauthor.
710	2		_aSpringerLink (Online service)
773	0		_tSpringer eBooks
776	0	8	_iPrinted edition: _z9780387292601
856	4	0	_uhttp://dx.doi.org/10.1007/978-0-387-29261-8 _zVer el texto completo en las instalaciones del CICY
912			_aZDB-2-CMS
942			_2ddc _cER
999			_c56935 _d56935