000			03395nam a22004695i 4500
001			978-0-387-75109-2
003			DE-He213
005			20250710084021.0
007			cr nn 008mamaa
008			100301s2008 xxu| s |||| 0|eng d
020			_a9780387751092 _a99780387751092
024	7		_a10.1007/978-0-387-75109-2 _2doi
082	0	4	_a620.44 _223
100	1		_aPelliccione, Matthew. _eauthor.
245	1	0	_aEvolution of Thin Film Morphology _h[recurso electrónico] : _bModeling and Simulations / _cby Matthew Pelliccione, Toh-Ming Lu.
264		1	_aNew York, NY : _bSpringer New York, _c2008.
300			_aXI, 206 p. _bonline resource.
336			_atext _btxt _2rdacontent
337			_acomputer _bc _2rdamedia
338			_arecurso en línea _bcr _2rdacarrier
347			_atext file _bPDF _2rda
490	1		_aMaterials Science, _x0933-033X ; _v108
505	0		_aDescription of Thin Film Morphology -- Surface Statistics -- Self-Affine Surfaces -- Mounded Surfaces -- Continuum Surface Growth Models -- Stochastic Growth Equations -- Small World Growth Model -- Discrete Surface Growth Models -- Monte Carlo Simulations -- Solid-on-Solid Models -- Ballistic Aggregation Models -- Concluding Remarks.
520			_aThin film deposition is the most ubiquitous and critical of the processes used to manufacture high tech devices. Morphology and microstructure of thin films directly controls their optical, magnetic, and electrical properties. This book focuses on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem both through numerical calculations based on Langevin continuum equations, and through Monte Carlo simulations based on discrete surface growth models when an analytical formulism is not convenient. Evolution of Thin-Film Morphology will be of benefit to university researchers and industrial scientists working in the areas of semiconductor processing, optical coating, plasma etching, patterning, micro-machining, polishing, tribology, and any discipline that requires an understanding of thin film growth processes. In particular, the reader will be introduced to the mathematical tools that are available to describe such a complex problem, and appreciate the utility of the various modeling methods through numerous example discussions. For beginners in the field, the text is written assuming a minimal background in mathematics and computer programming. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition.
650		0	_aCHEMISTRY.
650		0	_aOPTICAL MATERIALS.
650		0	_aCHEMISTRY, INORGANIC.
650		0	_aSURFACES (PHYSICS).
650	1	4	_aCHEMISTRY.
650	2	4	_aSURFACES AND INTERFACES, THIN FILMS.
650	2	4	_aOPTICAL AND ELECTRONIC MATERIALS.
650	2	4	_aTRIBOLOGY, CORROSION AND COATINGS.
700	1		_aLu, Toh-Ming. _eauthor.
710	2		_aSpringerLink (Online service)
773	0		_tSpringer eBooks
776	0	8	_iPrinted edition: _z9780387751085
830		0	_aMaterials Science, _x0933-033X ; _v108
856	4	0	_uhttp://dx.doi.org/10.1007/978-0-387-75109-2 _zVer el texto completo en las instalaciones del CICY
912			_aZDB-2-CMS
942			_2ddc _cER
999			_c58658 _d58658